Photographic chemical waste handling apparatus and method

ABSTRACT

A waste gas and a waste liquid, containing chemicals which have been used in the processing of film, are brought into contact with each other in a waste holding chamber. During such contact, the waste liquid serves to substantially completely remove a noxious substance from the waste gas. Thereafter, the waste gas is vented from the chamber into the atmosphere without the polluting affect that the noxious substance might otherwise produce.

United States Patent [1 1 Gibbons et al.

PHOTOGRAPHIC CHEMICAL WASTE HANDLING APPARATUS AND METHOD Inventors:Burton C. Gibbons, Henrietta;

Harry L. Westacott, Fairport, both of NY.

Eastman Kodak Company, Rochester, NY.

Filed: June 4, 1973 Appl. No.: 366,819

Assignee:

US. Cl. 354/300, 55/70 Int. Cl. G03d 7/00 Field of Search 95/89 R, 89 G,94 G;

References Cited UNITED STATES PATENTS 11/1934 Breton 95/89 G Sept. 17,1974 3,323,436 6/1967 Hafer et a1 95/89 G 3,679,369 7/1972 Hashimoto etal 95/89 G X FOREIGN PATENTS OR APPLICATIONS 1,480,476 4/1967 France95/89 G Primary Examiner-Fred L. Braun Attorney, Agent, or Firm-Mr. D.R. Arndt [5 7] ABSTRACT A waste gas and a waste liquid, containingchemicals which have been used in the processing of film, are broughtinto contact with each other in a waste holding chamber. During suchcontact, the waste liquid serves to substantially completely remove anoxious substance from the waste gas. Thereafter, the waste gas isvented from the chamber into the atmosphere without the polluting affectthat the noxious substance might otherwise produce.

8 Claims, 2 Drawing Figures R E AIR SUPPLY DE VE LOP- 3 TOP STATION WA STE 30 DISPOSAL Pmmwsm mu SHEEI 1 or 2' I l/II FIX LIOUID SUPPLY RI/vsE'LIQUID SUPPLY F IX- RINSE S TAT/ON PURGE AIR SUPPLY I FATMOSPHEREDEVELOP LIQUID SUPPLY STOP LIQUID SUPPLY "FIG/l" FIX L-IOUID SUPPLYRINSE LIQUID SUPPLY FIX-RINSE STATION PURGE AIR SUPPLY sum 2 m2(ATMOSPHERE \DEVELOP- STOP STATION Pmminsm 1 m4 LIQUID SUPPLY LIQUIDSUPPLY DEVELOP 5 TOP 30 I WASTE n/s asm.

FIG. 2

PHOTOGRAPHIC CHEMICAL WASTE HANDLING APPARATUS AND METHOD CROSSREFERENCE TO RELATED APPLICATION Reference is made to commonly assignedcopending US. patent application Ser. No. 309,311, entitled A METHOD ANDAPPARATUS FOR PROCESSING A FILM INSERT IN AN APERTURE CARD and filed inthe name of Donald J. Stoffel on Nov. 24, 1972.

BACKGROUND OF THE INVENTION 1. Field of the Invention The presentinvention relates to a photographic chemical waste handling apparatusand method for handling waste chemicals used in the processing of film.More particularly, the invention relates to a photographic chemicalwaste handling apparatus and method by which a waste gas is passedthrough a waste liquid to substantially completely remove a noxioussubstance from the waste gas.

2. Description of the Prior Art In wet process developing of film, it iswell known that various processing fluids must be applied in a givensequence to the film. In attempting to automate such film developing,processor, apparatus has been devised wherein metered quantities ofdifferent processing fluids are successively applied to film in aprocessing cavity, with each successive fresh processing fluid servingto supplant the preceding waste fluid in the cavity. Examples of thiskind of processor apparatus are disclosed, for instance, in US. Pat.Nos. 3,233,532 and 3,525,295 which were respectively patented Feb. 8,1966 and Aug. 25, 1970.

The processing fluids successively passed through the processing cavitymay include a develop liquid containing chemicals such as hydroquinoneand phenidone for developing the film image, a stop liquid containing achemical such as acetic acid for neutralizing the action of the developliquid, a fix liquid containing a chemical such as ammonium thiosulfatefor fixing the film image, and a wash water for rinsing the film.Moreover, the processing fluids may include blasts of pressured airwhich are passed through the processing cavity to clean or purge thecavity of residue waste liquid and to dry the film as well as thecavity. Should the residue waste liquid in the processing cavity containa chemical, such as ammonia, which is readily vaporized and which isnoxious in its gaseous form, then the air blast may free some of thischemical from the waste liquid. Thereafter, the waste air charged withthe chemical, such as ammonia, is discharged into the atmosphere. Thispractice of discharging the waste air into the atmosphere has obviousshortcomings, since the waste air may contain a concentration ofammonia, for example, which is sufficient to cause a noxious workingenvironment.

It is well known that ammonia may be substantially completely removedfrom an ammoniaand air mixture by passing such mixture through water,since ammonia is very soluble in water. A film processor employing thistechnique is disclosed, for example, in US. Pat. NO. 1,980,469 which waspatented Nov. 13, 1934. Such processor apparatus appears to require afresh water supply for substantially completely removing ammonia, usedin the processing of film, from an ammonia and air mixture. The waterabsorbing ammonia is uti- In view of the foregoing, it will beappreciated that a film processor in which ammonia is a waste chemicaland which utilizes at least one of the spent, i.e., used, filmprocessing liquids as an ammonia absorbent, has obvious advantages.

SUMMARY OF THE INVENTION Therefore, it is separate objects of thepresent invention to provide a photographic chemical waste handlingapparatus and method which, respectively, are improved over the priorart just described.

It is further separate objects of the present invention to provide aphotographic chemical waste handling apparatus and method whichgenerally prevent any polluting affect that the waste chemicals mightotherwise have on the working environment.

Other separate objects of the present invention are to provide aphotographic chemical waste handling apparatus and method which utilizesat least one of the fluids used in the processing of film to generallyprevent any polluting affect that the waste chemicals might otherwisehave on the working environment.

Still other separate objects of the present invention are to provide aphotographic chemical waste handling apparatus and method by which awaste gas is passed through a waste liquid to substantially completelyremove anoxious substance from the waste gas.

In accordance with the present invention there is disclosed, in detailhereinafter, a photographic chemical waste handling apparatus and methodfor handling (a) a waste gas of a kind which contains a noxioussubstance and (b) a waste liquid of the kind which can substantiallycompletely remove the noxious substance from the waste gas. The wastegas and the waste liquid,

containing chemicals previously used in the processing of film, arebrought into contact with each other in a waste holding chamber. Duringsuch contact, the waste liquid serves to substantially completely removethe noxious substance from the waste gas. Thereafter, the waste gas isvented from the chamber into the atmosphere without the polluting affectthat the noxious substance might otherwise produce.

BRIEF DESCRIPTION OF THE DRAWINGS The above-mentioned and other featuresand objects cessor members to the waste handling apparatus; and

DESCRIPTION OF THE PREFERRED EMBODIMENT Because photographic filmprocessors and the general operations associated therewith are wellknown in the art, the description hereinafter will be directed inparticular only to those processor members forming part of, orcooperating most directly with, a method and apparatus in accordancewith the present invention. It is to be understood, however, thatprocessor components not specifically shown or described may takevarious forms selectable from those known in the art.

Referring now to the drawings and in particular to FIG. 1, there isshown in block format certain processor members for successivelyapplying metered or regulated quantities of different processing fluidsto exposed film located first in a develop-stop processing station 1 andthereafter in a fix-rinse processing station 2. Structural details ofthese processing stations 1 and 2 are specifically described in commonlyassigned copending US. patent application Ser. No. 309,311 (more fullyreferenced hereinbefore). The processing fluids successively passedthrough the develop-stop station 1 and applied to the exposed filmtherein, include a develop liquid containing chemicals such ashydroquinone and phenidone for developing the film image, a stop liquidcontaining a chemical such as acetic acid for neutralizing the action ofthe develop liquid, and pressured air for removing any residual waste orspent processing liquid from the develop-stop station and the film. Theprocessing fluids successively passed through the fix-rinse station 2and applied to the film therein, include a fix liquid containing achemical such as ammonium thiosulfate for fixing the film image, a rinsewater which may contain a chemical such as ammonium hydroxide forrinsing the film, and pressured air for removing any residual wasteprocessing liquid from the fix-rinse station and the film. Naturally,the dwell time of the film in each of the develop, stop, fix and rinseliquids, as well as the temperatures of these liquids, is rather closelycontrolled for effective image development.

At the onset of the processing cycle, an electromechanical controldevice 3 momentarily actuates a develop liquid pump 4 and a three-wayvalve 5 for feeding a plug or small quantity (such as 1.6 cc) of developliquid from a develop liquid supply 6 into the developstop station 1.After sufficient develop time (such as 4 seconds) has elapsed, thecontrol device 3 momentarily actuates a stop liquid pump 7 and thethree-way valve 5 for feeding a small quantity (such as 1.6 cc) of stopliquid from a stop liquid supply 8 into the develop-stop station 1. Thefresh unused stop liquid serves to supplant the waste develop liquid inthe developstop station, causing the waste develop liquid to flow into awaste conduit or line 9 which, as shown in FIG. 1, is connected to thedevelop-stop station. After a sufficient stop time (such as 3 seconds)has elapsed, the control device 3 momentarily actuates a purge air valve10 and the three-way valve 5 for feeding a blast or charge of pressuredair (such as 400 cc at 25 psig) from a purge air supply 11, through thedevelop-stop station l and the waste conduit 9, and into a chemicalwaste receiving or handling chamber 12 (the details of which I aredescribed. below). This air blast removes or purges the waste developand stop liquids from the waste conduit 9 and the develop-stop station1, respectively, and flushes such wasteliquids into the waste receivingchamber 12, within a matter of seconds. FIG. 1 depicts the wastedevelop-stop liquid, flushed into the chamber 12, as several liquiddroplets 13 and a liquid column l4 and depicts the air blast, passedinto such chamber, by several arrows 15.

In a like manner, the electromechanical control device 3 momentarilyactuates a fix liquid pump 16 and a three-way valve 17 for feeding aplug" or small quantity (such as 1.6 cc) of fix liquid from a fix liquidsupply 18 into the fix-rinse station 2. After a sufficient fix time(such as 4 seconds) has elapsed, the control device 3 momentarilyactuates a rinse liquid pump 19 and the three-way valve 17 for feeding asmall quantity (such as 2.1 cc) of rinse liquid from a rinse liquidsupply 20 into the fix-rinse station 2. The fresh unused rinse liquidserves to supplant the waste fix liquid in the fix-rinse station 2,causing the waste fix liquid to flow into a waste conduit or line 21which, as shown in FIG. 1, is connected to the fix-rinse station. Aftera sufficient rinse time (such as 3 seconds) has elapsed, the controldevice 3 momentarily actuates a purge air valve 22 and the three-wayvalve 17 for feeding a blast or charge of pressured air from the purgeair supply 11, through the fix-rinse station 2 and the waste conduit 21,and into another chemical waste receiving or holding chamber 23 (thedetails of which are described below). This air blast purges the wastefix and rinse liquids from the waste conduit 21 and the fix-rinse staion2, respectively, and flushes such waste liquids into the waste receivingchamber 23, within a matter'of seconds. FIG. 1 depicts the wastefix-rinse liquid, flushed into the chamber 23, as several liquiddroplets 24 and depicts the air blast, passed into such chamber, byseveral arrows 25.

In one particular application of the foregoing develop-stop andfix-rinse processing cycles, an exposed film piece on a KODAK RETNARcamera card was processed using KODAK RETNAR developer, stop, fix andrinse. The temperature of the developer, stop and fix was maintainedabout 130F and the temperature of the rinse and purge air was maintainedabout F. The liquid and air volumes and the processing dwell times forthe respective metered quantities of processing fluids were those statedabove.

Now considering the details of the waste developstop-air receivingchamber 12, it can be seen in FIG. 1 that such chamber has an inletopening 26 which is connected to the waste conduit 9 and through whichthe waste air 15 and the waste develop-stop liquid l3, 14 are receivedinto this chamber. A vent opening 27, arranged at the same elevation asthat of the inlet opening 26, permits the waste air 15 to escape fromthe chamber 12 and into the atmosphere. A drain opening 28, arrangedsomewhat below the inlet and vent openings 26 and 27, allows any amountof waste developstop liquid exceeding a given quantity to drain from thechamber 12 as shown in FIG. 2. Such drained liquid enters a drainconduit or line 29, and is conveyed therealong to a waste receptacle orother disposal 30.

The details of the fix-rinse-air waste receiving chamber 23 are shown inFIG. 1. In particular, the chamber 23 has an inlet 31 which is connectedto the waste conduit 21 and through which the waste fix-rinse liquid 24and the waste gas 25 are received into this chamber. The waste fix-rinseliquid 24 accumulates in the chamber 23, as shown in FIG. 2, until afloat or ball valve 32 floats in such accumulated liquid, opening adrain opening 33 and allowing the accumulated liquid to drain from thechamber 23. This drained liquid enters the drain conduit 29, and isconveyed therealong to the waste disposal 30. The waste air 25 passedinto the chamber 23 is vented therefrom by means of a vent opening 34,arranged slightly above the inlet opening 31. This vented air isconveyed along a vent conduit 35, passing through an inlet opening 36 inthe waste develop-stop-air receiving chamber 12. As shown in FIG. 1, theinlet opening 36 serves to introduce the waste air 25 into the chamber12 at a location bubbling such waste air through the waste develop-stopliquid column 14. After passing through the waste liquid column 14, thewaste gas 25 is vented from the chamber 12 and into the atmosphere viathe vent opening 27.

As stated hereinbefore, the fresh fix liquid coming from the fix liquid.supply 18 may contain ammonium thiusulfate, and the fresh rinse watercoming from the rinse liquid supply may contain ammonium hydroxide.Therefore, the air blast which purges the waste fix and rinse liquidsfrom the fix-rinse station 2 and the waste conduit 21 and which movessuch waste-liquids into the waste receiving chamber 23, frees respectiveamounts of ammoniafrom the ammonium thiosulfate and the ammoniumhydroxide. The ammonia released from the ammonium thiosulfate is less inamount than that released from the ammonium hydroxide, since as is wellknown ammonia is more easily vaporized from ammonium hydroxide than fromammonium thiosulfate. When the waste air charged with the ammonia isbubbled through the waste develop-stop liquid column 14 in the wastereceiving chamber 12, the ammonia is substantially completely absorbedby such waste liquid. This separation of the ammonia from the waste air25 occurs due to the fact that the waste developstop liquid containswater and acetic acid (though water alone is sufficient to bring aboutthis ammonia separation). Accordingly, venting of the waste air 25 fromthe chamber 12 and into the atmosphere generally does not bring aboutany polluting affect that might otherwise occur should the ammoniaremain in such waste air.

Although H08. 1 and 2 show the develop-stop station 1 and the fix-rinsestation 2 as occupying different locations in a processing region of aprocessor, it will be appreciated by one having ordinary skill in theart that these stations could just as well occupy the same location inthe processing region.

The present invention has been described in detail with particularreference to a preferred embodiment thereof, but it will be understoodthat variations and modifications can be effected within the spirit andscope of the invention.

-We claim:

I. An improved photographic processor, wherein there is provided aprocessing region at which photographic material is processed and fromwhich there is separately discharged (0) a waste gas of the kind whichmay contain a noxious substance and (b) a waste liquid of the kind whichcan substantially completely remove the noxious substance from ,suchwaste gas, and wherein the improvement comprises:

means defining a chamber for receiving such waste gas and such wasteliquid; 5 means for conveying such waste liquid from said processingregion into said chamber; and means for conveying such waste gas fromsaid processing region to said chamber and for introducing the waste gasinto said chamber at a location passing the waste gas through such wasteliquid in said chamber to substantially completely remove the noxioussubstance from the waste gas.

2. The improvement as recited in claim 1, further comprising:

means disposed on said chamber defining means for draining from saidchamber, any amount of such waste liquid which exceeds a given quantity;

a waste receptacle; and

means for conveying such waste liquid from said draining means into saidwaste receptacle.

3. The improvement as recited in claim 2, further comprising: i

means disposed on said chamber defining means for 25 venting from saidchamber, such waste gas from which the noxious substance has beensubstantially completely removed. 4. A photographic chemical wastehandling apparatus for handling (a) a waste gas of the kind whichcontains a noxious substance and (b) a waste liquid of the kind whichcan substantially completely remove the noxious substance from suchwaste gas, said apparatus comprising:

means defining a chamber for receiving such waste gas and such wasteliquid, and for storing a given quantity of the waste liquid; meansdisposed on said chamber defining means for draining from said chamber,any amount of such waste liquid which exceeds the given quantity;

a waste receptacle;

means for conveying such waste liquid from said draining means into saidwaste receptacle; means for introducing such waste gas into said chamberat a location passing the waste gas through such waste liquid in saidchamber to substantially completely remove the noxious substance fromthe waste gas; and

means disposed on said chamber defining means for venting from saidchamber, such waste gas which has passed through such waste liquid.

5. A photographic chemical waste handling apparatus for handling (a) afirst waste liquid, (b) a waste gas of the kind which contains a noxioussubstance, and (c) a second waste liquid of the kind which cansubstantially completely remove the noxious substance from such wastegas, said apparatus comprising:

means defining a first chamber for receiving such first waste liquid andsuch waste gas together, and for allowing separation of the two;

means disposed on said first chamber defining means for draining fromsaid first chamber, such first waste liquid separated in said firstchamber from such waste gas;

means defining a second chamber for receiving such second waste liquidand such waste gas individually, and for storing a given quantity of thesecond waste liquid;

LII

means disposed on said second chamber defining means for draining fromsaid second chamber, any amount of such second waste liquid whichexceeds the given quantity; means for conveying such waste gas from saidfirst chamber to said second chamber and for introducing the wastegasinto said second chamber at a location passing the waste gas throughsuch second waste liquid in said second chamber to substantiallycompletely remove the noxious substance from the waste gas; and meansdisposed on said second chamber defining means for venting from saidsecond chamber, such waste gas which has passedthrough such wasteliquid. 6. A photographic chemical waste handling apparatus for handling(a) a first waste liquid, (b) a waste gas of the kind which containsammonia and (c) a second waste liquid of the kind which cansubstantially completely absorb the ammonia from such waste gas, saidapparatus comprising:

means defining a first fixed volume chamber for receiving such firstwaste liquid and such waste gas together, and for allowing separation ofthe two; said first chamber defining means including an inlet openingfor receiving such first waste liquid and such waste gas in said firstchamber, a vent opening located above said gas and first liquid inletopening for venting the waste gas from said first chamber, and a drainopening located below said gas and first liquid inlet opening fordraining the first waste liquid from said first chamber; a float valvelocated within said first chamber for opening and closing said firstliquid drain opening; means defining a second fixed volume chamber forreceiving such second waste liquid and such waste gas individually, andfor storing a given quantity of the second waste liquid; said secondchamber defining means including a drain opening for draining suchsecond waste liquid from said second chamber, an inlet opening locatedabove said second liquid drain opening for receiving the second wasteliquid in said second chamber, an inlet opening located below saidsecond liquid drain opening for receiving such waste gas in said secondchamber to bubble the waste gas through the second waste liquid in saidchamber, and a vent opening located above said second liquid drainopening for venting the waste gas from said second chamber; meansconnecting said gas vent opening on said first chamber defining meansand said gas inlet opening on said second chamber defining means for conveying such waste gas from said first chamber to said second chamber;-

a waste receptacle; and

means for conveying such first waste liquid from said first liquid drainopening on said first chamber de fining means to said waste receptacleand for conveyingsuch'second waste liquid from said second liquid drainopening on said second chamber defining means to said receptacle,

7. A photographic chemical waste handling method for handling (a) awaste gas of the kind which contains a noxious substance and (b) a wasteliquid of the kind which can substantially completely remove the noxioussubstance from such waste gas, said method comprising:

conveying such waste liquid from a film processing region to a chemicalwaste receiving chamber; conveying such waste gas from the processingregion to the receiving chamber;

bubbling such waste gas in the receiving chamber through such wasteliquid in the chamber to substantially completely remove the noxioussubstance from the waste gas; and

venting from the receiving chamber, such waste gas which is passedthrough such waste liquid.

8. A photographic chemical waste handling method for handling (a) awaste gas of the kind which contains a noxious substance and (b) a wasteliquid of the kind which can substantially completely remove the noxioussubstance from such waste gas, said method comprismg:

conveying such waste liquid from a film processing region to a chemicalwaste receiving chamber; storing a given quantity of such waste liquidin the receiving chamber;

draining from the receiving chamber, any amount of such waste liquidwhich exceeds the given quantity;

conveying such waste gas from the processing region to the receivingstation;

introducing such waste gas into the receiving chamber at a locationbubbling the waste gas through such waste liquid in the chamber tosubstantially completely remove the noxious substance from the wastegas; and

venting from the receiving chamber, such waste gas which is passedthrough such waste liquid.

1. An improved photographic processor, wherein there is provided aprocessing region at which photographic material is processed and fromwhich there is separately discharged (a) a waste gas of the kind whichmay contain a noxious substance and (b) a waste liquid of the kind whichcan substantially completely remove the noxious substance from suchwaste gas, and wherein the improvement comprises: means defining achamber for receiving such waste gas and such waste liquid; means forconveying such waste liquid from said processing region into saidchamber; and means for conveying such waste gas from said processingregion to said chamber and for introducing the waste gas into saidchamber at a location passing the waste gas through such waste liquid insaid chamber to substantially completely remove the noxious substancefrom the waste gas.
 2. The improvement as recited in claim 1, furthercomprising: means disposed on said chamber defining means for drainingfrom said chamber, any amount of such waste liquid which exceeds a givenquantity; a waste receptacle; and means for conveying such waste liquidfrom said draining means into said waste receptacle.
 3. The improvementas recited in claim 2, further comprising: means disposed on saidchamber defining means for venting from said chamber, such waste gasfrom which the noxious substance has been substantially completelyremoved.
 4. A photographic chemical waste handling apparatus forhandling (a) a waste gas of the kind which contains a noxious substanceand (b) a waste liquid of the kind which can substantially completelyremove the noxious substance from such waste gas, said apparatuscomprising: means defining a chamber for receiving such waste gas andsuch waste liquid, and for storing a given quantity of the waste liquid;means disposed on said chamber defining means for draining from saidchamber, any amount of such waste liquid which exceeds the givenquantity; a waste receptacle; means for conveying such waste liquid fromsaid draining means into said waste receptacle; means for introducingsuch waste gas into said chamber at a location passing the waste gasthrough such waste liquid in said chamber to substantially completelyremove the noxious substance from the waste gas; and means disposed onsaid chamber defining means for venting from said chamber, such wastegas which has passed through such waste liquid.
 5. A photographicchemical waste handling apparatus for handling (a) a first waste liquid,(b) a waste gas of the kind which contains a noxious substance, and (c)a second waste liquid of the kind which can substantially completelyremove the noxious substance from such waste gas, said apparatuscomprising: means defining a first chamber for receiving such firstwaste liquid and such waste gas together, and for allowing separation ofthe two; means disposed on said first chamber defining means fordraining from said first chamber, such first waste liquid separated insaid first chamber from such waste gas; means defining a second chamberfor receiving such second waste liquid and such waste gas individually,and for storing a given quantity of the second waste liquid; meansdisposed on said second chamber defining means for draining from saidsecond chamber, any amount of such second waste liquid which exceeds thegiven quantity; means for conveying such waste gas from said firstchamber to said second chamber and for introducing the waste gas intosaid second chamber at a location passing the waste gas through suchsecond waste liquid in said second chamber to substantially completelyremove the noxious substance from the waste gas; and means disposed onsaid second chamber defining means for venting from said second chamber,such waste gas which has passed through such waste liquid.
 6. Aphotographic chemical waste handling apparatus for handling (a) a firstwaste liquid, (b) a waste gas of the kind which contains ammonia and (c)a second waste liquid of the kind which can substantially completelyabsorb the ammonia from such waste gas, said apparatus comprising: meansdefining a first fixed volume chamber for receiving such first wasteliquid and such waste gas together, and for allowing separation of thetwo; said first chamber defining means including an inlet opening forreceiving such first waste liquid and such waste gas in said firstchamber, a vent opening located above said gas and first liquid inletopening for venting the waste gas from said first chamber, and a drainopening located below said gas and first liquid inlet opening fordraining the first waste liquid from said first chamber; a float valvelocated within said first chamber for opening and closing said firstliquid drain opening; means defining a second fixed volume chamber forreceiving such second waste liquid and such waste gas individually, andfor storing a given quantity of the second waste liquid; said secondchamber defining means including a drain opening for draining suchsecond waste liquid from said second chamber, an inlet opening locatedabove said second liquid drain opening for receiving the second wasteliquid in said second chamber, an inlet opening located below saidsecond liquid drain opening for receiving such waste gas in said secondchamber to bubble the waste gas through the second waste liquid in saidchamber, and a vent opening located above said second liquid drainopening for venting the waste gas from said second chamber; meansconnecting said gas vent opening on said first chamber defining meansand said gas inlet opening on said second chamber defining means forconveying such waste gas from said first chamber to said second chamber;a waste receptacle; and means for conveying such first waste liquid fromsaid first liquid drain opening on said first chamber defining means tosaid waste receptacle and for conveying such second waste liquid fromsaid second liquid drain opening on said second chamber defining meansto said receptacle.
 7. A photographic chemical waste handling method forhandling (a) a waste gas of the kind which contains a noxious substanceand (b) a waste liquid of the kind which can substantially completelyremove the noxious substance from such waste gas, said methodcomprising: conveying such waste liquid from a film processing region toa chemical waste receiving chamber; conveying such waste gas from thEprocessing region to the receiving chamber; bubbling such waste gas inthe receiving chamber through such waste liquid in the chamber tosubstantially completely remove the noxious substance from the wastegas; and venting from the receiving chamber, such waste gas which ispassed through such waste liquid.
 8. A photographic chemical wastehandling method for handling (a) a waste gas of the kind which containsa noxious substance and (b) a waste liquid of the kind which cansubstantially completely remove the noxious substance from such wastegas, said method comprising: conveying such waste liquid from a filmprocessing region to a chemical waste receiving chamber; storing a givenquantity of such waste liquid in the receiving chamber; draining fromthe receiving chamber, any amount of such waste liquid which exceeds thegiven quantity; conveying such waste gas from the processing region tothe receiving station; introducing such waste gas into the receivingchamber at a location bubbling the waste gas through such waste liquidin the chamber to substantially completely remove the noxious substancefrom the waste gas; and venting from the receiving chamber, such wastegas which is passed through such waste liquid.